SAN FRANCISCO — Lithography photomasks are likely to continue to rely on the current standard 4X magnification and 26-millimeter field size through the 32-nanometer node, according to a consensus of ...
The existing lithography mask standard of 4x magnification with a 26mm field size is likely resilient enough to take the semiconductor industry to the 32 nm half-pitch generation, Sematech said ...
From my casual research into the subject, it appears that the close focus distance for the 55mm f/3.5 MF and 105mm f/2.8 AF Micro-Nikkors is 21cm and 31cm respectively, which is consistent with a ...
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